Gregory Lee Griffin
	George H. Nusloch II Professor Ph.D., Princeton University, 1979 Office: 306 ChE Building Telephone: 225.578.3064 E-mail: griffin@lsu.edu

Professor Griffin's research is focused on the chemical processing of materials for microelectronics and advanced ceramics. A major effort is underway to develop chemical vapor deposition techniques for copper thin films. Copper is considered the material of choice for interconnect metallization in future generations of sub-half-micron VLSI integrated circuits. Our research is aimed at understanding the reaction kinetics and operating conditions needed to obtain uniform, conformal films. Our experimental apparatus includes several unique capabilities, including on-line measurements of film growth (for example, to monitor the transient stages of film nucleation and growth), and real-time monitoring of changes in reactant composition using mass spectrometer sampling.

Recent Publications

• "Chemical Vapor Deposition of Copper from Cu(II) Precursors"; with A. W. Maverick, The Chemistry of Metal CVD, T. Kodas and M. Hampden-Smith (Eds), VCH Verlagsgesellschaft mbH, Weinheim, 1994.
  
  
• "Reactor Transport Effects in Copper APCVD"; with Jue Wang; Reginald B. Little; and Gilbert Lai; Thin Solid Films, 262 31-38 (1995).
  
  
• "Toward a Unified Reaction Mechanism for Copper CVD"; Borgharkar, N.S.; Griffin, G.L.; J. Electrochem. Soc., 145, 347-352 (1998).
  
  
• "Alcohol Assisted Growth of Copper CVD Films"; Borgharkar, N.S.; Griffin, G.L.; James, A.; Maverick, A.W.; Thin Solid Films, 320, 86-94 (1998).
  
  
• "Solution Delivery of Cu(hfac)₂ for Alcohol-Assisted Copper CVD"; Borgharkar, N.S.; Griffin, G.L.; Fan, H.; Maverick, A.W.; J. Electrochem. Soc., 146, 1041-1045 (1999).