John C. Flake
	Associate Professor and Cain Professor Ph.D., Georgia Institute of Technology, 1998 B.Sc., Louisiana Tech University, 1993 Office: 216 ChE Building Telephone: 225.578.3060 E-mail: johnflake [at] lsu.edu

Research Interests

Professor Flake's research focuses on electronic materials and thin films processing. Research applications include micro & nanoscale electronics, MEMS, photovoltaics and biosensors. Dr. Flake joins the ChE department after eight years experience at industrial R&D labs (IBM and Motorola). He has authored ten patents related to thin film transistors and CMOS electronics processing.

Recent Publications

Wanli Xu and John C. Flake, "Composite Silicon Nanowire Anodes for Secondary Lithium-Ion Cells", Journal of The Electrochemical Society, 157 (1), A41-A45, 2010.

Sri Sai S. Vegunta, Johnpeter N. Ngunjiri, and John C. Flake, "Electrochemical and Thermal Grafting of Alkyl Grignard Reagents onto (100) Silicon Surfaces", Langmuir, 2009.

Wanli Xu, Vadim Palshin, and John C. Flake, "Nickel Monosilicide Contact Formation in Electrolessly Etched Silicon Nanowires Deposited onto Electrodes", Journal of The Electrochemical Society, 156 (7), H544-H547, 2009.

Johnpeter N. Ngunjiri, Sri S. S. Vegunta, and John C. Flake, "Cathodic Electrografting of Alkyl Nanopatterns on Silicon (100)", Journal of The Electrochemical Society, 156 (7), H516-H521, 2009.

Z. R. Scheibal, W. Xu, J. F. Audiffred, J. E. Henry, and J. C. Flake, "Protein Immobilization onto Silicon Nanowires via Electrografting of Hexynoic Acid", Electrochemical and Solid-State Letters, 11 8 K81-K84 2008.

J.C. Flake, J.P. Jacquemin, M. Hartig, E. Sicurani, P. Vannier, 206th Meeting of the Electrochemical Society, Honolulu, HI October 8, 2004.

J.C. Flake, Y. Solomentsev, K. Cooper, J. Cooper, "Wafer Scale Profile Evolution of Electrochemically Deposited Copper Films", J. Electrochem. Soc. 150, C195 2003.

K. Cooper, J. Cooper, J. Groschopf, J. Flake, Y. Solomentsev, and J. Farkas, "Effects of Particle Concentration on CMP", Electrochem. Solid-State Lett. 5, G109 2002.

E. Delamarche, M. Geissler, J. Vichiconti, W.S. Graham, P.A. Andry, J.C. Flake, P.M. Fryer, R.W. Nunes, B. Michel, E.J. O'Sullivan, H. Schmid, R.L. Wisnieff, "Electroless Deposition of NiB on 15 Inch Glass Substrates for the Fabrication of Transistor Gates for Liquid Crystal Displays", Langmuir 19 (14); 5923-5935, 2003.

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